Surface uniform wet etching of ZnO films and influence of oxygen annealing on etching properties.

Tao Zhang Lei Sun Dedong Han Yi Wang Ruqi Han

Published in: NEMS (2011)

Keyphrases

thin film
film thickness
grain size
chemical vapor deposition
plasma etching
integrated circuit
high density
multi layer
magnetic recording
desirable properties
surface reconstruction
structural properties
simulated annealing
room temperature
three dimensional
silicon dioxide
ni fe
data sets