Fabrication Of Ultrahigh-Density Nano-Pyramid Arrays (Npas) On (100) Silicon Wafer Using Scanning Probe Lithography And Anisotropic Wet Etching.
Jeng T. SheuCheng C. ChenSun P. YehHseih T. ChouPublished in: Int. J. Comput. Eng. Sci. (2003)
Keyphrases
- integrated circuit
- plasma etching
- electron beam
- low density
- semiconductor devices
- high density
- nano scale
- metal oxide semiconductor
- thin film
- multiscale
- multiresolution
- magnetic recording
- electron beam lithography
- coarse to fine
- scale space
- electron microscopy
- low cost
- scan data
- structured light
- anisotropic diffusion
- diffusion filtering
- image pyramids
- image processing
- neural network
- semiconductor manufacturing
- atomic force microscopy
- space charge
- binary tree
- diffusion equation
- noise removal
- massively parallel
- image representation
- input image
- image segmentation
- clustering algorithm