Photoluminescence properties of SiOxCy-films deposited under argon atmosphere and Si-based organometallic precursor by O-Cat-CVD.
Manmohan JainAndrés Galdámez-MartínezAteet DuttYasuhiro MatsumotoPublished in: CCE (2021)
Keyphrases
- rf sputtering
- chemical vapor deposition
- magnetic field
- data sets
- electrical properties
- information systems
- case study
- metal oxide
- leakage current
- structural properties
- high density
- topological properties
- neural network
- permalloy films
- computer vision
- thin film
- steady state
- multiresolution
- image processing
- knowledge base