Growth Characteristics of Calcium Silicides Films from the Deposited Ca Films at the Different Sputtering Ar Pressure.

Yinye Yang Quan Xie

Published in: ISCSCT (1) (2008)

Keyphrases

thin film
film thickness
chemical vapor deposition
silicon nitride
grain size
multi layer
electrical properties
high density
augmented reality
electron microscopy
cellular automata
room temperature
permalloy films
computer vision
rf sputtering
magnetic field
three dimensional
growth rate
human computer interaction