Yue Kuo

Publication Activity (10 Years)

Years Active: 1992-2021
Publications (10 Years): 2

Top Topics

Dirichlet Processes

Statistical Model

Semiconductor Manufacturing

Mixture Modeling

Top Venues

IEEE Trans. Reliab.

Comput. Ind. Eng.

Publications

Yuan Chen, Tao Yuan, Suk Joo Bae, Yue Kuo
Two-level differential burn-in policy for spatially heterogeneous defect units in semiconductor manufacturing. Comput. Ind. Eng. 162 (2021)
Tao Yuan, Suk Joo Bae, Yue Kuo
Statistical Models of Overdispersed Spatial Defects for Predicting the Yield of Integrated Circuits. IEEE Trans. Reliab. 69 (2) (2020)
Tao Yuan, Xi Liu, Saleem Z. Ramadan, Yue Kuo
Bayesian Analysis for Accelerated Life Tests Using a Dirichlet Process Weibull Mixture Model. IEEE Trans. Reliab. 63 (1) (2014)
Tao Yuan, Yue Kuo
Bayesian Analysis of Hazard Rate, Change Point, and Cost-Optimal Burn-In Time for Electronic Devices. IEEE Trans. Reliab. 59 (1) (2010)
S. Chatterjee, Yue Kuo, J. Lu, J.-Y. Tewg, P. Majhi
high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress. Microelectron. Reliab. 46 (1) (2006)
Yue Kuo
Preface. IBM J. Res. Dev. 43 (1) (1999)
Yue Kuo, Kenji Okajima, Masatomo Takeichi
Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays. IBM J. Res. Dev. 43 (1) (1999)
Evan G. Colgan, Paul M. Alt, Robert L. Wisnieff, Peter M. Fryer, Eileen A. Galligan, William S. Graham, Paul F. Greier, Raymond R. Horton, Harold Ifill, Leslie C. Jenkins, Richard A. John, Richard I. Kaufman, Yue Kuo, Alphonso P. Lanzetta, Kenneth F. Latzko, Frank R. Libsch, Shui-Chih Alan Lien, Steven E. Millman, Robert W. Nywening, Robert J. Polastre, Carl G. Powell, Rick A. Rand, John J. Ritsko, Mary B. Rothwell, John L. Staples, Kevin W. Warren, John S. Wilson, Steven L. Wright
A 10.5-in.-diagonal SXGA active-matrix display. IBM J. Res. Dev. 42 (3) (1998)
Yue Kuo
Reactive ion etching technology in thin-film-transistor processing. IBM J. Res. Dev. 36 (1) (1992)