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Vandana Kumari
ORCID
Publication Activity (10 Years)
Years Active: 2012-2023
Publications (10 Years): 7
Top Topics
Success Factors
Simulation Study
Elman Network
Rna Secondary Structures
Top Venues
VDAT
ISQED
Netw. Model. Anal. Health Informatics Bioinform.
Microelectron. J.
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Publications
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Vandana Kumari
,
Pradip Kumar Bala
,
Shibashish Chakraborty
An Empirical Study of User Adoption of Cryptocurrency Using Blockchain Technology: Analysing Role of Success Factors like Technology Awareness and Financial Literacy.
J. Theor. Appl. Electron. Commer. Res.
18 (3) (2023)
Vandana Kumari
,
Maya Chandrakar
,
Manoj Kumar Majumder
Performance Analysis of Cylindrical Through Silicon Via with Interfacial Crack.
ISQED
(2023)
Neha
,
Vandana Kumari
,
Mridula Gupta
,
Manoj Saxena
Investigation of proton irradiated dual field plate AlGaN/GaN HEMTs: TCAD based assessment.
Microelectron. J.
122 (2022)
Khushwant Sehra
,
Vandana Kumari
,
Poonam Kasturi
,
Mridula Gupta
,
Meena Mishra
,
Dipendra Singh Rawal
,
Manoj Saxena
Interplay Between γ-Ray Irradiation and 3DEG for Dosimeter Applications.
IEEE Access
10 (2022)
Preeti Singh
,
Vandana Kumari
,
Manoj Saxena
,
Mridula Gupta
Threshold Voltage Investigation of Recessed Dual-Gate MISHEMT: Simulation Study.
VDAT
(2018)
Vandana Kumari
,
Manoj Saxena
,
Mridula Gupta
Variability Investigation of Double Gate JunctionLess (DG-JL) Transistor for Circuit Design Perspective.
VDAT
(2017)
Rashmi Tripathi
,
Sunil Patel
,
Vandana Kumari
,
Pavan Chakraborty
,
Pritish Kumar Varadwaj
DeepLNC, a long non-coding RNA prediction tool using deep neural network.
Netw. Model. Anal. Health Informatics Bioinform.
5 (1) (2016)
Vandana Kumari
,
Manoj Saxena
,
R. S. Gupta
,
Mridula Gupta
Temperature dependent drain current model for Gate Stack Insulated Shallow Extension Silicon On Nothing (ISESON) MOSFET for wide operating temperature range.
Microelectron. Reliab.
52 (6) (2012)
Vandana Kumari
,
Manoj Saxena
,
R. S. Gupta
,
Mridula Gupta
Simulation study of Insulated Shallow Extension Silicon On Nothing (ISESON) MOSFET for high temperature applications.
Microelectron. Reliab.
52 (8) (2012)