Login / Signup
Pure-Metal Replacement Gate for Reliable 30 nm Pitch Scaled 3D NAND Flash.
S. Rachidi
S. Ramesh
Davide Tierno
G. L. Donadio
A. Pacco
J. W. Maes
Y. Jeong
Antonio Arreghini
Geert Van den Bosch
Maarten Rosmeulen
Published in:
IMW (2024)
Keyphrases
</>
field effect transistors
cmos technology
cost effective
nm technology
metal oxide
data structure
database
search engine
website
high quality
steady state
low power
data storage
nano scale
leakage current
metal oxide semiconductor