Charge trapping in SiO2/HfO2/TiN gate stack.
François LimeGérard GhibaudoB. GuillaumotPublished in: Microelectron. Reliab. (2003)
Keyphrases
- leakage current
- silicon dioxide
- electrical properties
- low voltage
- space charge
- power line
- charge coupled devices
- neural network
- genetic algorithm
- image processing
- multiresolution
- learning rate
- printed circuit boards
- x ray
- gate insulator
- database
- medical images
- hidden markov models
- computer vision
- learning algorithm
- databases
- real time