Deposition of ZnO Films for FBAR Device Fabrication.

Hae-il Song Linh Mai Mun-Hyuk Yim Giwan Yoon

Published in: J. Inform. and Commun. Convergence Engineering (2005)

Keyphrases

thin film
chemical vapor deposition
plasma etching
high density
electrical properties
grain size
film thickness
liquid crystal displays
field effect transistors
multi layer
semiconductor devices
room temperature
thin film transistor
data acquisition
high speed
low density