Multiscale three-dimensional CFD modeling for PECVD of amorphous silicon thin films.
Marquis CroseWeiqi ZhangAnh TranPanagiotis D. ChristofidesPublished in: Comput. Chem. Eng. (2018)
Keyphrases
- thin film
- chemical vapor deposition
- multiscale
- high density
- three dimensional
- solar cell
- plasma etching
- short circuit
- grain size
- multi layer
- image segmentation
- viewpoint
- data streams
- range images
- multi view
- white light interferometry
- room temperature
- database
- scale space
- semi supervised
- wavelet transform
- artificial neural networks
- databases