Effect of Plasma Oxygen Content on the Size and Content of Silicon Nanoclusters in Amorphous SiOx Films Obtained with Plasma-Enhanced Chemical Vapor Deposition.

Vladimir A. Terekhov Evgeniy I. Terukov Yurii K. Undalov Konstantin A. Barkov Nikolay A. Kurilo Sergey A. Ivkov Dmitry N. Nesterov Pavel Seredin Dmitry Goloshchapov Dmitry Minakov Elena V. Popova Anatoly N. Lukin Irina N. Trapeznikova

Published in: Symmetry (2023)

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