Si-HfO2-Ni RRAM.

D. Y. Lu X. A. Tran H. Y. Yu D. M. Huang Y. Y. Lin S. J. Ding P. F. Wang Ming-Fu Li

Published in: ASICON (2013)

Keyphrases

leakage current
low voltage
electrical properties
low energy
silicon dioxide
low cost
high density
chemical vapor deposition
database replication
power line
real time
low power
power consumption
high speed
three dimensional
knowledge base
real world