Login / Signup
Oxygen induced limitation on grain growth in RF sputtered Indium tin oxide thin films.
Buddhi Sagar Lamsal
Yung Huh
Mukul Dubey
K. C. Manoj
Swaminathan Venkatesan
Qiquan Qiao
David Galipeau
Qi Hua Fan
Published in:
EIT (2013)
Keyphrases
</>
room temperature
thin film
rf sputtered
high density
short circuit
electron microscopy
multi layer
grain size
film thickness
silicon nitride
high temperature
plasma etching
white light interferometry
semi supervised
low cost
low density