Time Dependent Dielectric Breakdown of Cobalt and Ruthenium Interconnects at 36nm Pitch.
H. HuangP. S. McLaughinJ. J. KellyC.-C. YangR. G. SouthwickM. WangGriselda BonillaG. KarvePublished in: IRPS (2019)
Keyphrases
- leakage current
- electrical properties
- low voltage
- cmos technology
- silicon dioxide
- input output
- low power
- gate insulator
- travel time
- lower cost
- power line
- fiber optic
- data sets
- power dissipation
- transmission line
- artificial intelligence
- acoustic features
- power management
- remote sensing
- chemical vapor deposition
- low cost
- database