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Cuprous Oxide Thin Films Deposited by Microwave-Assisted Chemical Bath Deposition.
Odín Reyes-Vallejo
Rocío M. Sánchez-Albores
A. Ashok
Arturo Fernández-Madrigal
José Juan Díaz
E. F. Vázquez-Vázquez
Salvador Escobar
P. J. Sebastian
Published in:
CCE (2023)
Keyphrases
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thin film
silicon nitride
electron microscopy
high density
short circuit
multi layer
plasma etching
grain size
solar cell
chemical vapor deposition
room temperature
white light interferometry
database
neural network
databases
film thickness
high speed