Effects of aluminum incorporation on hafnium oxide film using plasma immersion ion implantation.
Banani SenBing-Liang YangHei WongChi-Wah KokP. K. ChuA. HuangPublished in: Microelectron. Reliab. (2008)
Keyphrases
- thin film
- silicon nitride
- high energy
- electron microscopy
- film thickness
- high density
- room temperature
- image processing
- virtual reality
- augmented reality
- real time
- machine learning
- silicon dioxide
- scanning electron microscope
- chemical vapor deposition
- field effect transistors
- databases
- computer vision
- genetic algorithm