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Current-Voltage Hysteresis Characteristics in MOS Capacitors with Si-Implanted Oxide.

Toshihiro MatsudaShinsuke IshimaruShingo NoharaHideyuki IwataKiyotaka KomokuTakayuki MorishitaTakashi Ohzone
Published in: IEICE Trans. Electron. (2009)
Keyphrases
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