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Estimation of Optimum Ion Energy for the Reduction of Resistivity in Bias Sputtering of ITO Thin Films.
Kiyoshi Ishii
Yoshifumi Saitou
Kengo Furutani
Hiroshi Sakuma
Yoshito Ikeda
Published in:
IEICE Trans. Electron. (2008)
Keyphrases
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thin film
grain size
electron microscopy
low energy
room temperature
spatial distribution
film thickness
high energy
high density
short circuit
multi layer
solar cell
global optimum
plasma etching
energy consumption
supervised learning
silicon nitride
machine learning
estimation algorithm
estimation error
data streams