Towards high performance sub-10nm finW bulk FinFET technology.
Thomas ChiarellaS. KubicekE. RosseelRomain RitzenthalerAndriy HikavyyP. EybenA. De KeersgieterL.-Å. RagnarssonM.-S. KimS.-A. ChewTom SchramS. DemuynckMiroslav CupákLuc RijndersMorin DehanNaoto HoriguchiJérôme MitardDan MocutaAnda MocutaAaron Voon-Yew TheanPublished in: ESSDERC (2016)