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Towards high performance sub-10nm finW bulk FinFET technology.

Thomas ChiarellaS. KubicekE. RosseelRomain RitzenthalerAndriy HikavyyP. EybenA. De KeersgieterL.-Å. RagnarssonM.-S. KimS.-A. ChewTom SchramS. DemuynckMiroslav CupákLuc RijndersMorin DehanNaoto HoriguchiJérôme MitardDan MocutaAnda MocutaAaron Voon-Yew Thean
Published in: ESSDERC (2016)
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