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Plasma etch and dielectric deposition processes for TSV Reveal.
Keith Buchanan
Dave Thomas
Hefin Griffiths
Kathrine Crook
Daniel Archard
Mark Carruthers
Masahiko Tanaka
Published in:
3DIC (2011)
Keyphrases
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chemical vapor deposition
thin film
high density
plasma etching
electrical properties
information retrieval
artificial intelligence
database
stochastic processes