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Characterization of Atom Diffusion in Polycrystalline Si/SiGe/Si Stacked Gate.

Hideki MurakamiYoshikazu MoriwakiMasafumi FujitakeDaisuke AzumaSeiichiro HigashiSeiichi Miyazaki
Published in: IEICE Trans. Electron. (2005)
Keyphrases
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