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Characterization of Atom Diffusion in Polycrystalline Si/SiGe/Si Stacked Gate.
Hideki Murakami
Yoshikazu Moriwaki
Masafumi Fujitake
Daisuke Azuma
Seiichiro Higashi
Seiichi Miyazaki
Published in:
IEICE Trans. Electron. (2005)
Keyphrases
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thin film
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chance discovery
gate dielectrics
database replication
chemical vapor deposition
leakage current
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metal oxide
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