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Oxide-Tunneling Leakage Suppressed SRAM for Sub-65-nm Very Large Scale Integrated Circuits.
Ji-Hye Bong
Kwan-Hee Jo
Kyeong-Sik Min
Sung-Mo Kang
Published in:
J. Low Power Electron. (2011)
Keyphrases
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leakage current
integrated circuit
low voltage
electrical properties
power line
silicon dioxide
scale space
image processing
electron beam
control system
high speed
infrared
metal oxide semiconductor