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Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing.
K. L. Ng
Nian Zhan
Chi-Wah Kok
M. C. Poon
Hei Wong
Published in:
Microelectron. Reliab. (2003)
Keyphrases
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electrical properties
leakage current
high temperature
film thickness
high frequency
room temperature
low voltage
simulated annealing
magnetic field
silicon dioxide
evolutionary algorithm
neural network
mobile robot
mahalanobis distance