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Gate tunneling leakage current behavior of 40 nm PD SOI NMOS device considering the floating body effect.
H. J. Hung
J. B. Kuo
D. Chen
Chih-Sheng Yeh
Published in:
Microelectron. Reliab. (2010)
Keyphrases
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leakage current
low voltage
electrical properties
silicon dioxide
power line
silicon on insulator
gate insulator
human body
cmos technology
computer vision
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