Fabrication and evaluation of silicon micromechanical resonator using neutral beam etching technology.
Nguyen Van ToanTomohiro KubotaHalubai SeknarSeiji SamukawaTakahito OnoPublished in: NEMS (2014)
Keyphrases
- integrated circuit
- metal oxide semiconductor
- plasma etching
- high density
- electron beam
- silicon on insulator
- case study
- cost effective
- rapid development
- semiconductor devices
- low cost
- electron beam lithography
- magnetic recording
- thin film
- high speed
- field effect transistors
- gold standard
- x ray
- data sets
- evaluation model
- cross section
- database
- cmos technology
- information retrieval
- data mining