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Hydrogen Plasma Annealing of ZnO Films Deposited by Magnetron Sputtering with Third Electrode.
Kanji Yasui
Yutaka Ooshima
Yuichiro Kuroki
Hiroshi Nishiyama
Masasuke Takata
Tadashi Akahane
Published in:
IEICE Trans. Electron. (2009)
Keyphrases
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chemical vapor deposition
thin film
film thickness
simulated annealing
high density
electron microscopy
plasma etching
grain size
magnetic field
databases
electric field
multi layer
silicon nitride
high speed
evolutionary algorithm
search algorithm
neural network
real time