Fabrication and Characterization of nanowires by Atomic Force Microscope Lithography.
Lo Ming FokYun-Hui LiuWen Jung LiPublished in: IROS (2006)
Keyphrases
- electron beam
- electron beam lithography
- integrated circuit
- x ray
- high speed
- semiconductor devices
- high density
- design parameters
- real world
- case study
- real time
- closed loop
- magnetic recording
- position control
- visual inspection
- control scheme
- evolutionary algorithm
- database systems
- information systems
- social networks
- databases
- data sets