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Effect of laser annealing on amorphous silicon carbide films prepared by PECVD.
Pin Lv
Zhe Chen
Alice H. X. Zhang
Published in:
NEMS (2009)
Keyphrases
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chemical vapor deposition
thin film
high density
silicon dioxide
plasma etching
multi layer
information retrieval
low cost
simulated annealing
steady state
grain size
space charge
data sets
film thickness