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Optical and electrical characterization of hafnium oxide deposited by liquid injection atomic layer deposition.

P. TaechakumputS. TaylorOctavian BuiuR. J. PotterPaul R. ChalkerA. C. Jones
Published in: Microelectron. Reliab. (2007)
Keyphrases
  • electrical properties
  • silicon nitride
  • multi layer
  • application layer
  • atmospheric turbulence
  • film thickness
  • leakage current
  • neural network
  • high speed
  • solid state
  • x ray
  • optical networks
  • silicon dioxide