Etching characteristics of a silicon surface induced by focused ion beam irradiation.
Noritaka KawasegiNoboru MoritaShigeru YamadaNoboru TakanoTatsuo OyamaKiwamu AshidaJun TaniguchiIwao MiyamotoSadao MomotaPublished in: Int. J. Manuf. Technol. Manag. (2006)