Reduction of Series Resistance in Top-Gate ZnO Thin-Film Transistors by Air Exposure and Oxygen Plasma Treatment.
Zili TangMohammad Shafiqul IslamSigurd WagnerNaveen VermaJames C. SturmPublished in: DRC (2024)
Keyphrases
- thin film
- high density
- white light interferometry
- field effect transistors
- short circuit
- plasma etching
- chemical vapor deposition
- cmos technology
- low density
- grain size
- room temperature
- electron microscopy
- solar cell
- liquid crystal displays
- genetic algorithm
- data mining
- multi layer
- low power
- data warehouse
- wireless sensor networks