Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability.

Gerald Lucovsky

Published in: IBM J. Res. Dev. (1999)

Keyphrases

gate dielectrics
electrical properties
si sio
field effect transistors
real time
high density
chemical reactions
data processing
artificial intelligence
energy consumption
computational power
efficient processing
processing capabilities
video sequences
website
neural network
databases