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Fabrication of deep lateral single-crystal-silicon blaze micro-grating by Inductively-Coupled-Plasma Reactive Ion Etch.
Y. H. Lin
C. J. Weng
C. Y. Su
W. Hsu
Published in:
NEMS (2012)
Keyphrases
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plasma etching
high density
thin film
low density
chemical vapor deposition
long period
agent architecture
high energy
data center
semiconductor devices
neural network
manufacturing process
real time
control system
computer simulation
electro mechanical systems