Investigation of Zr-N thin films for use as diffusion barrier in Cu metallization.

Ying Wang Fei Cao Minghui Ding Dawei Yang

Published in: Microelectron. J. (2007)

Keyphrases

thin film
electron microscopy
high density
grain size
anisotropic diffusion
multi layer
short circuit
diffusion process
solar cell
white light interferometry
room temperature
diffusion model
integrated circuit
chemical vapor deposition
tensor field
information diffusion
plasma etching
active contours