Login / Signup
Precise VTH Control of MFSFET with 5 nm-thick FeND-HfO2 Realized by Kr-Plasma Sputtering for Pt Gate Electrode Deposition.
Shun'ichiro Ohmi
Masakazu Tanuma
Joong-Won Shin
Published in:
DRC (2023)
Keyphrases
</>
leakage current
electrical properties
chemical vapor deposition
thin film
plasma etching
magnetic field
electric field
control system
optimal control
data sets
control method
control problems
control theory
adaptive control
low voltage
robotic systems
machine learning
neural network