Properties of epitaxial AlN thin film deposited on sapphire substrate by ECR plasma.
Satoru KanekoTakeshi ItoManabu YasuiMasahito KurouchiHironori ToriiTakao AmazawaTakashi TikumasuTakatoshi NaganoLee SeughwanSungkyun ParkHirofumi TakikawaPublished in: ICAIT (2013)