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Thickness dependence of the structural and electrical properties of copper films deposited by dc magnetron sputtering technique.
Kah-Yoong Chan
Teck-Yong Tou
Bee-San Teo
Published in:
Microelectron. J. (2006)
Keyphrases
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film thickness
electrical properties
thin film
room temperature
silicon nitride
high density
electron microscopy
grain size
structural information
structural model
structural models
database
chemical vapor deposition
structural analysis
magnetic recording