Physics-separating artificial neural networks for predicting initial stages of Al sputtering and thin film deposition in Ar plasma discharges.
Tobias GergsThomas MussenbrockJan TrieschmannPublished in: CoRR (2022)
Keyphrases
- thin film
- initial stages
- artificial neural networks
- film thickness
- chemical vapor deposition
- plasma etching
- augmented reality
- high density
- multi layer
- grain size
- back propagation
- magnetic field
- computational intelligence
- using artificial neural networks
- short circuit
- neural network
- computer science
- electron microscopy
- feed forward
- room temperature
- genetic algorithm
- data mining
- neural nets
- genetic algorithm ga
- single image
- white light interferometry