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Neural network modeling of inter-characteristics of silicon nitride film deposited by using a plasma-enhanced chemical vapor deposition.
Su Jin Lee
Byungwhan Kim
Sung Wook Baik
Published in:
Expert Syst. Appl. (2011)
Keyphrases
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chemical vapor deposition
thin film
neural network
film thickness
high density
multi layer
silicon nitride
electron microscopy
artificial neural networks
neural nets
feed forward
room temperature
neural network model
modeling method
neural network is trained
back propagation
plasma etching