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Kao-Cheng Lin
Publication Activity (10 Years)
Years Active: 2007-2019
Publications (10 Years): 4
Top Topics
Write Operations
Metal Oxide Semiconductor
Embedded Dram
Field Effect Transistors
Top Venues
ISSCC
VLSI Circuits
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Publications
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Hidehiro Fujiwara
,
Chih-Yu Lin
,
Hsien-Yu Pan
,
Cheng-Han Lin
,
Po-Yi Huang
,
Kao-Cheng Lin
,
Jhon-Jhy Liaw
,
Yen-Huei Chen
,
Hung-Jen Liao
,
Jonathan Chang
A 7nm 2.1GHz Dual-Port SRAM with WL-RC Optimization and Dummy-Read-Recovery Circuitry to Mitigate Read- Disturb-Write Issue.
ISSCC
(2019)
Jonathan Chang
,
Yen-Huei Chen
,
Wei-Min Chan
,
Sahil Preet Singh
,
Hank Cheng
,
Hidehiro Fujiwara
,
Jih-Yu Lin
,
Kao-Cheng Lin
,
John Hung
,
Robin Lee
,
Hung-Jen Liao
,
Jhon-Jhy Liaw
,
Quincy Li
,
Chih-Yung Lin
,
Mu-Chi Chiang
,
Shien-Yang Wu
12.1 A 7nm 256Mb SRAM in high-k metal-gate FinFET technology with write-assist circuitry for low-VMIN applications.
ISSCC
(2017)
Yen-Huei Chen
,
Kao-Cheng Lin
,
Ching-Wei Wu
,
Wei-Min Chan
,
Jhon-Jhy Liaw
,
Hung-Jen Liao
,
Jonathan Chang
A 16nm dual-port SRAM with partial suppressed word-line, dummy read recovery and negative bit-line circuitries for low VMIN applications.
VLSI Circuits
(2016)
Hidehiro Fujiwara
,
Li-Wen Wang
,
Yen-Huei Chen
,
Kao-Cheng Lin
,
Dar Sun
,
Shin-Rung Wu
,
Jhon-Jhy Liaw
,
Chih-Yung Lin
,
Mu-Chi Chiang
,
Hung-Jen Liao
,
Shien-Yang Wu
,
Jonathan Chang
17.2 A 64kb 16nm asynchronous disturb current free 2-port SRAM with PMOS pass-gates for FinFET technologies.
ISSCC
(2015)
Jyi-Tsong Lin
,
Yi-Chuen Eng
,
Tai-Yi Lee
,
Kao-Cheng Lin
Analysis of Si-body thickness variation for a new 40 nm gate length bFDSOI.
VLSI Design
(2007)