I. Eisele

Publication Activity (10 Years)

Years Active: 2001-2005
Publications (10 Years): 0

Publications

V. Capodieci, F. Wiest, T. Sulima, J. Schulze, I. Eisele
as gate dielectric for sub-100nm CMOS and DRAM technology. Microelectron. Reliab. 45 (5-6) (2005)
G. Shrivastav, S. Mahapatra, V. Ramgopal Rao, J. Vasi, K. G. Anil, C. Fink, Walter Hansch, I. Eisele
erformance Optimization Of 60 Nm Channel Length Vertical Mosfets Using Channel Engineering. VLSI Design (2001)
A. Stadler, I. Genchev, A. Bergmaier, G. Dollinger, V. Petrova-Koch, Walter Hansch, H. Baumgärtner, I. Eisele
Nitrogen implantations for rapid thermal oxinitride layers. Microelectron. Reliab. 41 (7) (2001)