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Internal photoemission technique for high-k oxide/semiconductor band offset determination: The influence of semiconductor bulk properties.
Olof Engström
Henryk M. Przewlocki
Ivona Z. Mitrovic
Stephen Hall
Published in:
ESSDERC (2014)
Keyphrases
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silicon dioxide
semiconductor manufacturing
field effect transistors
electron microscopy
wide range
structural properties
desirable properties
gallium arsenide
plasma etching
magnetic field
semiconductor devices
frequency band
real time
artificial neural networks
case study
learning algorithm
information retrieval