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Transistor sizing in lithography-aware regular fabrics.

Felipe S. MarranghelloVinícius Dal BemAndré Inácio ReisFrancesc MollRenato P. Ribas
Published in: SBCCI (2011)
Keyphrases
  • integrated circuit
  • electron beam
  • high speed
  • defect detection
  • power losses
  • neural network
  • machine learning
  • learning algorithm
  • data structure
  • low power
  • context free
  • regular patterns