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Integration of feedback control and run-to-run control for plasma enhanced atomic layer deposition of hafnium oxide thin films.
Sungil Yun
Yangyao Ding
Yichi Zhang
Panagiotis D. Christofides
Published in:
Comput. Chem. Eng. (2021)
Keyphrases
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thin film
feedback control
room temperature
multi layer
plasma etching
chemical vapor deposition
closed loop
open loop
optimal control
adaptive control
silicon nitride
high density
inverted pendulum
grain size
neural network
spatial information
energy consumption
feedback controller
control system
learning algorithm