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Characterization of Ti diffusion in PVD deposited WTi/AlCu metallization on monocrystalline Si by means of secondary ion mass spectroscopy.
Mathias Plappert
Oliver Humbel
Angelika Koprowski
Mathias Nowottnick
Published in:
Microelectron. Reliab. (2012)
Keyphrases
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electron microscopy
x ray
infrared
high quality
multiscale
diffusion processes
leakage current
metal oxide