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DTCO for DSA-MP Hybrid Lithography with Double-BCP Materials in Sub-7nm Node.

Jiaojiao OuXiaoqing XuBrian ClineGreg YericDavid Z. Pan
Published in: ICCD (2017)
Keyphrases
  • tree structure
  • electron beam
  • learning materials
  • hybrid approaches
  • decision trees
  • search space
  • logic programs
  • graph structure
  • hybrid learning
  • electron beam lithography