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Different aspect ratio pyramidal tips obtained by wet etching of (100) and (111) silicon.

Drago ResnikDanilo VrtacnikUros AljancicMatej MozekSlavko Amon
Published in: Microelectron. J. (2003)
Keyphrases
  • aspect ratio
  • plasma etching
  • real time
  • focal length
  • training set
  • d objects
  • motion estimation
  • semi supervised
  • integrated circuit
  • high density