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Porous silicon prepared by electrochemical etching of silicon eptaxial layer.
Mile Ivanda
Maja Balarin
Ozren Gamulin
Vedran Derek
Davor Ristic
Svetozar Music
Mira Ristic
Kresimir Furic
Zorica Crnjak Orel
Published in:
MIPRO (2012)
Keyphrases
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application layer
plasma etching
low cost
high density
high speed
silicon dioxide
field effect transistors
integrated circuit
search engine
case study
gallium arsenide
space charge
metal oxide semiconductor