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Graph-based subfield scheduling for electron-beam photomask fabrication.
Shao-Yun Fang
Wei-Yu Chen
Yao-Wen Chang
Published in:
ISPD (2012)
Keyphrases
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electron beam
x ray
integrated circuit
semiconductor devices
scheduling problem
design parameters
scheduling algorithm
resource allocation
round robin
electron beam lithography
parallel machines
graph model
resource constraints
semi supervised
real time
single machine
fuzzy logic
knowledge base
real world