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Exploring the limits of scanning electron microscopy for the metrology of critical dimensions of photoresist structures in the nanometer range.
Mauro Ciappa
Emre Ilgünsatiroglu
Alexey Yu. Illarionov
Published in:
Microelectron. Reliab. (2014)
Keyphrases
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electron microscopy
thin film
x ray
low energy
image stacks
wide range
image processing
three dimensional
camera calibration
low cost
single view
scan data
spatial and temporal dimensions